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Laser · Scribe · Data MatrixMark Types
SEMI T7 · M12 · M13Compliance Standards
1–50μmMark Depth Range
Si · GaAs · SiC · GlassSubstrate Types

Overview

Laser marking and re-identification are critical steps in wafer tracking and supply chain management. GINECHIP provides SEMI-standard soft mark and hard mark laser services supporting OCR, 2D matrix (Data Matrix ECC200), QR codes, and custom identification patterns — ensuring complete traceability of every wafer throughout its lifecycle.

We deliver industry-leading quality and precision with all marks compliant to SEMI T7, SEMI M1, and SEMI M12/M13 standards — compatible with wafers up to 300mm diameter.

Marking Services

SEMI Standard Wafer Marking

Alphanumeric, Data Matrix, and SEMI-font marks applied to frontside or backside at controlled depths of 5–50μm on silicon. Fully readable by OCR and machine vision systems, compliant with SEMI T7, M12, and M13.

Mark: Alphanumeric, Data Matrix, SEMI fontLocation: frontside or backsideDepth: 5–50μm (Si), controlledReadable: OCR + machine visionStandards: SEMI T7, M12, M13Wafer: 100mm–300mm

Shallow / Low-Damage Marking

Dot-matrix marks at 1–5μm depth for device-side and post-pattern wafers, placed in the scribe line with a debris extraction system to minimize particle generation and process contamination.

Depth: 1–5μm (shallow profile)Dot matrix formatDevice-side compatibleScribe-line placementMinimal debris: extraction systemIdeal for post-pattern wafers

Wafer Re-Identification

New identification applied to reclaimed wafers with a maintained cross-reference to the original ID, preserving full lot history. Compatible with thin wafers, frontside or backside, with photo documentation provided.

New ID applied to reclaimed wafersCross-reference to original ID maintainedCompatible with thin wafersFrontside or backside optionsFull lot history traceablePhoto documentation provided

High-Throughput Serialization

Sequential serialization with 2D Data Matrix codes per SEMI T7, encoding lot, wafer number, product, and date. Post-mark OCR verification and MES integration support throughput up to 100 wafers per hour.

Sequential serialization2D Data Matrix per SEMI T7Encoded: lot, wafer#, product, dateOCR verification post-markMES integration readyThroughput: up to 100 wph

Compound Semiconductor & Specialty Substrate Marking

Low-power marking tuned to each material: GaAs and InP at reduced power, 355nm UV laser for SiC, CO₂ or UV laser for glass, non-penetrative marks on TCO-coated wafers, and shallow-profile marking for thin substrates.

GaAs, InP: low-power markingSiC: UV (355nm) laserGlass: CO₂ or UV laserTCO-coated: non-penetrative markCeramic (Al₂O₃, AlN): standardThin wafer: shallow profile

Mark Removal & Surface Reconditioning

Chemical-mechanical removal of existing marks followed by surface reconditioning, verified by AFM to confirm no sub-surface cracking and no residual mark. Compatible with all wafer types, with before-and-after photo documentation.

Chemical-mechanical removalSurface reconditioning post-removalVerification: no residual markAFM: no sub-surface cracksCompatible with all wafer typesPhoto documentation before/after

SEMI Standard Compliance

All laser marks comply with SEMI T7, SEMI M1, and SEMI M12/M13 standards. Marks include alphanumeric characters, Data Matrix (ECC200), QR codes, and custom symbologies. Hard marks (20–80μm depth) and soft marks (5–20μm depth) are available depending on wafer reuse requirements.

Re-Identification Process

Our re-identification process follows a systematic workflow: laser ablation of previous marks, surface cleaning and preparation, new mark engraving, mark verification via automated optical inspection, and final certification. Each wafer is tracked through the entire process.

Ready to Get Started?

Contact our engineering team to discuss your specific requirements and receive a detailed quotation within 24 hours.

ISO 9001 CertifiedOCR Readable MarksSEMI T7 CompliantPhoto Documentation