기판
MEMS 프로세스
재처리
부속품
자원
기술 기사
회사
가게
2″ – 6″ Diameter galliumArsenide.statLabel1
Epi-Ready < 3Å RMS galliumArsenide.statLabel2
SI > 10⁷ Ω·cm galliumArsenide.statLabel3
VGF / LEC Growth galliumArsenide.statLabel4
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개요

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Diameter 2″ – 6″
EPD < 5×10² – 5×10³/cm²
Resistivity SI & doped
Yield / Quality Highest

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Diameter 3″ – 6″+
EPD 1–5×10⁴/cm²
Resistivity SI & doped
Yield / Quality Good (volume)

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Diameter D-shape (non-circular)
EPD < 5×10³/cm²
Resistivity SI & doped
Yield / Quality Specialty

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기술 사양

매개변수사용 가능한 범위/값
Diameter 2″ (50.8mm), 3″ (76.2mm), 4″ (100mm), 6″ (150mm)
Dopant Type SI-Undoped, N-type Si-doped, P-type Zn-doped
Resistivity SI: >10⁷ Ω·cm; N-type: 10⁻³–10⁻¹ Ω·cm
Crystal Orientation (100), (111)A, (111)B, off-cut 2°–15° toward (110)
Thickness 350μm, 500μm, 625μm standard (custom on request)
Surface Polish SSP, DSP, Epi-Ready — RMS < 3Å (AFM 5×5μm)
EPD (Etch Pit Density) < 5×10³/cm² (prime); < 5×10²/cm² (UHP grade)
TTV / Bow / Warp TTV < 5μm, Bow < 10μm, Warp < 15μm
Electron Mobility (μₑ) 8,500 cm²/V·s (undoped GaAs at 300K)
Bandgap 1.424 eV (direct, Γ-valley)
Dislocation Density Grade-dependent: prime < 5×10³/cm²; UHP < 5×10²/cm²
Growth Methods VGF (Vertical Gradient Freeze), LEC (Liquid-Encapsulated Czochralski), HB (Horizontal Bridgman)
Backside Treatment Etched, polished, or laser-marked per customer specification
Laser Mark SEMI M12/M13 compliant: soft-mark on front or back side
Flat / Notch Per SEMI M1: EJ (EJ-standard) or US flat configuration
Particle Count @ 0.3μm ≤ 10 particles (laser surface scan, SEMI M53 equivalent)
Packaging Vacuum-sealed single-wafer cassettes, Class 100 cleanroom
Compliance SEMI M1–M13, RoHS, REACH, JEDEC

응용

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품질 및 인증

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ISO 9001:2015 SEMI M1–M13 SEMI M36 Compliant RoHS / REACH