Silicon Wafer Distribution
& Advanced MEMS Lithography Service
Precision Patterning from Microns to Nanometers
Your Reliable Partner in Semiconductor Materials & Precision Microfabrication
Ginechip combines premium silicon wafer distribution with professional MEMS lithography service to support the entire product development cycle — from research prototypes to small-to-medium volume production.
We offer multiple lithography technologies including contact, stepper, laser direct write, and e-beam lithography, achieving resolutions as fine as 10nm. This enables high-precision patterning on silicon, SOI, glass, sapphire, and flexible substrates.
With strict process control, advanced cleanroom facilities, and experienced engineers, we help customers in MEMS, sensors, photonics, and power electronics accelerate innovation while reducing development time and cost.
Minimum Resolution
Years Experience
Fast Delivery
Certified Quality
Professional MEMS Foundry Lithography Service
We deliver high-precision photo lithography and nanofabrication services for MEMS devices, sensors, micro-optics, and advanced semiconductor applications.
Service Overview
Lithography is a core process in semiconductor and MEMS manufacturing. It uses exposure and development to create geometric patterns on photoresist, which are then transferred onto the substrate via etching. Ginechip offers both mask-based (contact & stepper) and maskless (laser direct write & e-beam) MEMS lithography service, supporting a wide range of substrates including silicon wafers, SOI, glass, sapphire, and flexible materials.
Technical Capabilities
Contact Lithography
Minimum feature size: 0.8–1μm
Alignment accuracy: ±0.5μm
Ideal for large-area patterning and cost-effective production.
Stepper / Projection Lithography
Minimum feature size: 150nm (0.15μm)
Overlay accuracy: ≤40nm
High precision for volume manufacturing on 4"–8" wafers.
Laser Direct Writing
Minimum feature size: 300–500nm
Maskless and flexible — perfect for rapid prototyping and process verification.
E-beam Lithography
Minimum feature size: 10–30nm
Ultra-high resolution for nano-scale structures and research devices.
Supported wafer sizes: 4", 6", 8" (selected 12"). We also handle small pieces and custom substrates.
Advanced Facilities & Equipment
Our Service Process Flow
Design Review & Mask Preparation
Wafer Cleaning & Photoresist Coating
Alignment & Exposure
Development & Pattern Inspection
Etching & Pattern Transfer
Final Metrology & Delivery
Our Expert Team
Our lithography team consists of senior process engineers with 8–18 years of hands-on experience in MEMS and semiconductor nanofabrication. They provide end-to-end support — from design consultation and process optimization to yield improvement.
Client Reviews
Why Trust Ginechip?
- One-stop solution combining wafer supply and lithography
- Advanced equipment with proven nanometer-level precision
- Fast prototyping to production turnaround
- Strict quality control and full process traceability
- Technical consultation by experienced engineers
Key Applications
Our MEMS lithography service powers innovation across multiple high-tech industries
MEMS Sensors
Accelerometers, gyroscopes, pressure, and gas sensors
Microfluidics
Lab-on-a-chip and biomedical diagnostic systems
Micro-Optics
Lenses, gratings, and diffractive optical elements
Power Electronics
IGBTs, MOSFETs, and high-voltage devices
Photonics
Waveguides, modulators, and photonic integrated circuits
Biomedical Devices
Implantable sensors and diagnostic microsystems
Automotive MEMS
TPMS, inertial sensors, and ADAS components
Aerospace & Defense
Radiation-hardened devices and navigation systems
Consumer Electronics
Smartphone sensors, wearables, and IoT devices
Ready to Bring Your MEMS Project to Life?
Contact us today for a competitive quote on silicon wafers or our precision MEMS lithography service.
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